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Functional properties of ferroelectric thin films are governed by domains that can be engineered by epitaxial strain. Soft x-ray microscopy can image domain structures with elemental and electronic sensitivity, but hitherto its application to strain-stabilized domains has been hindered by the absorption of soft x-rays in epitaxial substrates. Here, it is demonstrated how this limitation can be overcome by locally back-thinning the (110) TbScO 3 substrate of epitaxial K 0.6 Na 0.4 NbO 3 ferroelectric thin films to achieve soft x-ray transparency at the O -edge around 530 eV. Strain-induced ferroelectric stripe domains with periods down to 44 nm were resolved by scanning transmission x-ray microscopy and coherent diffractive imaging by exploiting the x-ray linear dichroism of hybridized O 2 p –Nb 4 d states, providing sensitivity to in-plane polarization components under normal incidence. The results establish soft x-ray microscopy for nanoscale imaging of epitaxial ferroelectric domain structures and open perspectives for time-resolved studies thereof.
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Schneider et al. (2026) studied this question.
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