Sputter‐Deposited MoSe 2 Thin Films for Supercapacitor Applications: Structural, Electrochemical, and Charge Storage Performance Evaluation

Supercapacitors have been considered as potential energy storage systems in view of their high power, fast charge–discharge, and long cycle life. Nevertheless, it is essential to construct advanced electrode materials having nanostructure well designed for improved energy storage ability. In the current work, MoSe 2 thin films were prepared on Ni foam substrates by RF magnetron sputtering with different deposition time (2, 5, 9, and 10 min) to explore the effect of growth time on their electrochemical properties. SEM measurements have indicated that the 9 min sputtered film had a well‐developed nanowall structure, with distinct surface characteristics. Thus, this electrode exhibited the highest areal capacitance among the investigated samples reaching 248.9 mF cm −2 at 1 mA cm −2 and a favorable cycling stability with 97.4% capacitance retention after as many as 5000 cycles (10 mA cm −2 ). These results demonstrate the potential of sputter‐deposited MoSe 2 nanowalls as electrode materials for supercapacitor applications.