Investigation of the Radiation Resistance of Diffraction Gratings Produced by Direct Laser Writing in the ZrO2 Layer

The paper studies the radiation resistance of a phase diffraction grating based on zirconium dioxide ZrO2 with a field size of 10 × 10 mm2 when exposed to continuous laser radiation. The diffraction grating was produced by high-resolution direct laser writing on a molybdenum film followed by plasma etching of the underlying ZrO2 layer. The effect of continuous laser radiation on optical elements was studied using an approach based on determining the value of the radiation power density at which the diffraction efficiency of the optical element changes within 10%. The measurements showed that the radiation resistance of the studied diffraction grating was about 17 MW/cm2.