Photolithography Patternable and Mechanically Robust Silver Nanowire Films for High‐Resolution Flexible Light‐Emitting Devices

Flexible transparent conductive electrodes based on silver nanowires (Ag NWs) show strong potential for flexible electronic devices, yet high-resolution patterning remains a major challenge. Here, we present a composite electrode that integrates Ag NWs with a conductive photoresist (CPR), achieving both high electrical conductivity and high-resolution patterning in a unified structure. Silver nanoparticles and dispersants are incorporated into the photoresist at a designed ratio to form CPR, which maintains good dispersion and excellent photolithographic performance. In this composite, the bottom Ag NWs network provides efficient charge transport, while the top CPR layer forms a dense protective coating. The CPR/Ag NWs structure enables high-resolution electrode patterning with a minimum line width of 7 µm using only exposure and development, without requiring conventional etching processes. Meanwhile, the CPR layer reduces surface roughness, enhances adhesion to the substrate, and improves environmental stability and mechanical reliability, ensuring structural integrity during photolithography. With this structure, we fabricate flexible AC electroluminescent devices with a line width of 50 µm and further demonstrate its compatibility with LED integration. This strategy offers a high-performance, high-resolution, and patternable electrode platform for flexible displays and wearable electronics.