Key points are not available for this paper at this time.
Measurements in magnetic fields applied at a small angle with respect to the two-dimensional plane of the electrons of low-density silicon metal-oxide--semiconductor field-effect transistors indicate that the Hall coefficient is independent of parallel field from H=0 to H>Hₒ₀ₓ, the field above which the longitudinal resistance saturates and the electrons have reached full spin polarization. This implies that the mobilities of the spin-up and spin-down electrons remain comparable at all magnetic fields and suggests there is strong mixing of spin-up and spin-down electron states.
Vitkalov et al. (Wed,) studied this question.