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Abstract Methods used in metrology of two‐dimensional magnetic microfields and based on direct interaction of the electron beam of scanning electron microscope (SEM) with the studied fields are described. An analytical expression for calculating the value of the field is presented. The errors and applicability of the methods have been estimated. The concepts discussed are illustrated by the experimental results of the measurements of some types of statistical and dynamic stray fields.
Рау et al. (1980) studied this question.