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Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm(2). The aim of this contribution is to give technical and practical backgrounds in this extremely flexible nanofabrication technique.
Matteo Altissimo (Tue,) studied this question.