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高浓度的硼杂质扩散到硅的浅表层，并随后的蚀刻显示出具有晶体对称性的规则蚀刻线阵列。这些模式被解释为由于非均匀分布的、尺寸不足的替代硼杂质在硅晶格中引起的应力而产生的滑移线。
H. J. Queisser (周五) 研究了这个问题。
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