Key points are not available for this paper at this time.
Chemical‐Mechanical Polishing for Fabricating Patterned W Metal Features as Chip Interconnects, Kaufman, F. B., Thompson, D. B., Broadie, R. E., Jaso, M. A., Guthrie, W. L., Pearson, D. J., Small, M. B.
Kaufman et al. (1991) studied this question.