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Combinations of circuit techniques enabling tolerance to V tau fluctuations in SRAM cell transistors during read or write operations and significant reductions in minimum operating voltage are reported. Implemented in a 9 Kb times 74 b PDSOI CMOS SRAM array with a conventional 65 nm SRAM cell and an ABIST, these techniques, demonstrate VMIN of 0.58 V and 0.40 V/0.54 V for single and dual V DD implementations respectively. The techniques consume a 10-12% overhead in area, improve performance marginally and also enable over 50% reduction in cell leakage with minimal circuit overhead.
Bhavnagarwala et al. (Fri,) studied this question.