Effect of temperature on Raman intensity of nm-thick WS2: combined effects of resonance Raman, optical properties, and interface optical interference

Temperature dependent Raman intensity of 2D materials features very rich information about the material's electronic structure, optical properties, and nm-level interface spacing. To date, there still lacks rigorous consideration of the combined effects. This renders the Raman intensity information less valuable in material studies. In this work, the Raman intensity of four supported multilayered WS2 samples are studied from 77 K to 757 K under 532 nm laser excitation. Resonance Raman scattering is observed, and we are able to evaluate the excitonic transition energy of B exciton and its broadening parameters. However, the resonance Raman effects cannot explain the Raman intensity variation in the high temperature range (room temperature to 757 K). The thermal expansion mismatch between WS2 and Si substrate at high temperatures (room temperature to 757 K) make the optical interference effects very strong and enhances the Raman intensity significantly. This interference effect is studied in detail by rigorously calculating and considering the thermal expansion of samples, the interface spacing change, and the optical indices change with temperature. Considering all of the above factors, it is concluded that the temperature dependent Raman intensity of the WS2 samples cannot be solely interpreted by its resonance behavior. The interface optical interference impacts the Raman intensity more significantly than the change of refractive indices with temperature.