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In the lithography process, subresolution assist features (SRAFs), as an essential resolution enhancement technique (RET), is applied to improve the pattern fidelity and enlarge the process window. In this article, we propose a robust constraint-aware SRAF generation method based on continuous transmission mask (CTM). The intensity distribution on the CTM is extracted to guide the SRAF generation. The SRAF insertion also honors the design rules, which is formulated as integer programming with quadratic constraints and solved by a fast yet efficient algorithm. A fast probe-based SRAF evolution method is proposed to determine the shapes of SRAFs. The effectiveness and efficiency are demonstrated based on the experimental results.
Yu et al. (Wed,) studied this question.
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