Study on debris contamination characteristics and control methods of DPP-type EUV light source

Key Points

• Debris contamination significantly affects optical systems in DPP-type extreme ultraviolet (EUV) light sources, complicating production efficiency.
• Specific particle size ranges were identified as critical, with control methods addressing these characteristics effectively.
• Observational analysis of contamination characteristics led to a set of proposed control strategies for EUV systems.
• Improving control methods for debris contamination may enhance optical performance and reliability in semiconductor manufacturing.