Back Cover In article number 2501325, Ko, Seo, Sung, Bae, and co-workers illustrate the controllable oxidation-state engineering of NiOx thin films achieved by adjusting the oxygen partial pressure during sputtering. The sputtering process enables precise, uniform, and large-area deposition of NiOx with tunable electronic properties, providing a scalable strategy for optimizing charge transport and interface quality in perovskite optoelectronic devices.
Yoo et al. (Sun,) studied this question.