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Displacement metrology with nanometer-level precision over macroscopic ranges is a key foundation for modern science and engineering. This review provides a comparative overview of Precision Nanometrology, covering measurement ranges from micrometers to meters and accuracies between 0.1 nm and 100 nm. Three main technologies are discussed: the Laser Interferometer (LI), the Grating Interferometer (GI), and the Time Grating Sensor (TGS). The LI is widely regarded as the traceable benchmark for highest resolution; the GI has been developed into a compact and stable solution based on diffraction gratings; and the TGS has emerged as a new approach that converts spatial displacement into the time domain, offering strong resilience to environmental fluctuations. For each technique, the principles, recent progress, and representative systems from the past two decades are reviewed. Particular attention is given to the trade-offs between resolution, robustness, and scalability, which are decisive for practical deployment. The review concludes with a comparative analysis of performance indicators and a perspective on future directions, highlighting hybrid architectures and application-driven requirements in precision manufacturing and advanced instrumentation.
Cui et al. (Thu,) studied this question.