PulseExploreJournal ClubDebatesTrendingResearchersJournals
Instagram
HomeExploreJournal ClubTrending
Synapse
⌘+K
Synapse
August 1, 1981Applied Physics Letters7 citations

Low-threshold 1.3-μm GaInAsP/InP buried heterostructure lasers by liquid phase epitaxy and metalorganic chemical vapor deposition

View Full Paper
WNW. NgCHChoong Seon HongHMH. M. Manasevit

Key Points

Key points are not available for this paper at this time.

Abstract

3μm GaInAsP/InP buried heterostructure lasers were successfully fabricated by using a hybrid combination of liquid phase epitaxy (LPE) and metalorganic chemical vapor deposition (MO-CVD). Definite advantages were found in the use of MO-CVD for the overgrowth of the optical and current confining layers. Excellent optical linearity up to two times the threshold current, as well as low-threshold current (57 mA), were obtained during cw operation at room temperature. A single longitudinal mode was observed at ∼1.11 times the threshold current.

Ask AI
Helpful
Bookmark
Share
View Full Paper

Cite This Study

Ng et al. (1981) studied this question.

synapsesocial.com/papers/6a6fbd93e5469ee92be097fahttps://doi.org/10.1063/1.92697
Ask AI
Helpful
Bookmark
Share
View Full Paper

Also Consider

Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context:

  1. 1High-output power InGaAsP (λ=1.3 μm) strip-buried heterostructure lasers1980 · 37 citations
  2. 2Effect of p -doping on carrier lifetime and threshold current density of 1.3 μm GaInAsP/InP lasers by liquid-phase epitaxy1980 · 15 citations
  3. 3Room-temperature cw operation of buried-stripe double-heterostructure GaInAsP/InP diode lasers1977 · 91 citations
  4. 4Dose dependence in the laser annealing of arsenic-implanted silicon1978 · 38 citations
  5. 5Liquid-phase epitaxial growth of lattice-matched InGaAsP on (100)-InP for the 1.15–1.31-μm spectral region1978 · 42 citations