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February 1, 1978Applied Physics Letters80 citationsOpen Access

Annealing of Te-implanted GaAs by ruby laser irradiation

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JGJ. A. GolovchenkoTVT. Venkatesan

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Abstract

A single pulse of ruby laser radiation is shown to cause significant regrowth in the amorphous region of heavily ion-implanted GaAs. The implanted Te atoms and the host material both show good channeling dips, suggesting essentially complete substitutionality of the Te. There has been only a minor redistribution of the tellurium atoms. The resulting local Te concentration in the laser-irradiated sample is more than ten times the known maximum solubility of Te in GaAs.

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Cite This Study

Golovchenko et al. (1978) studied this question.

synapsesocial.com/papers/6a81e43628bb6950eb610ae1https://doi.org/10.1063/1.89962
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