Plasma resistance and etching behavior of APS Y2O3 coatings modified via NH4F immersion process

Key Points

• Improved plasma resistance was observed in APS Y2O3 coatings modified via NH4F immersion, enhancing their durability.
• Quantitative analysis indicated a significant increase in resistance, outperforming unmodified coatings by over 30%.
• The approach involved a systematic assessment of etching behavior influenced by NH4F immersion on Y2O3 coatings.
• These findings highlight the potential for NH4F immersion to enhance durability in plasma environments, needing further exploration.