What does this research mean for the field?

TiO2 protective capping layers enhance the hydrogen plasma resistance of EUV mirrors and effectively remove Sn contaminants. Novelty: ClaimNovelty.NOVEL_FINDING. Consensus alignment: ConsensusAlignment.NEUTRAL.

What question did this study set out to answer?

The aim is to evaluate the performance of TiO2 capping layers in EUV lithography mirrors under plasma exposure.

March 6, 2026Nanoscale1 citations

TiO 2 Protective Capping for EUV Mirrors: Superior Hydrogen Plasma Resistance and Sn Contaminants Removal

SWSishu WangSichuan University ZYZongbiao YeSichuan University AWAndong Wu Wu

Key Points

The aim is to evaluate the performance of TiO2 capping layers in EUV lithography mirrors under plasma exposure.
Conducted plasma irradiation tests to assess durability
Implemented Sn removal techniques to evaluate capping effectiveness
Analyzed the stability of TiO2 under extreme conditions
TiO2 showed significantly better resistance to plasma damage compared to other materials
Effective removal of Sn contaminants was observed, enhancing mirror performance
Long-term stability of EUV mirrors was increased with TiO2 capping

Abstract

The long-term stability of extreme ultraviolet (EUV) lithography mirrors relies on protective capping layers capable of resisting plasma irradiation while simultaneously facilitating the removal of Sn contaminants. TiO 2 ,...

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Cite This Study

Wang et al. (Thu,) studied this question.

synapsesocial.com/papers/69aa70e7531e4c4a9ff5b162 https://doi.org/https://doi.org/10.1039/d5nr04590h

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