Novel silicone-free thermal interface materials enhance thermal conductivity and interfacial adhesion, suggesting better performance in electronics.
The rapid advancement of artificial intelligence, coupled with increasing device miniaturization and power density, has made thermal management a critical bottleneck limiting reliability and performance. Thermal interface materials (TIMs), which bridge chips and heat sinks, are essential in reducing thermal resistance. Silicone-based TIMs, despite their widespread use, suffer from weak interfacial bonding, micropore expansion, and delamination under thermal stress, undermining long-term reliability. This study proposes a novel silicon-free TIM system based on poly(ionic liquid)s (PILs), which systematically addresses the interfacial adhesion and thermal stability limitations. Poly(1-dodecyl-3-vinylimidazolium) bis(trifluoromethylsulfonyl)imide (P[lm12V]TFSI) exhibits strong interfacial adhesion to metal and semiconductor substrates (5.52 MPa for Cu and 3.92 MPa for Si), with a 5% weight-loss decomposition temperature reaching 280 °C, and reversible ionic bonding that enables self-healing and recyclability. To further enhance thermal conductivity, a dual-particle filler strategy employing high-sphericity silver particles was adopted. The resulting P[lm12V]TFSI/Ag composite exhibited a thermal conductivity of 17.2 W m-1 K-1 at 80 vol % loading, while maintaining robust interfacial adhesion (1.19 MPa on Si and 1.26 MPa on Cu). The material demonstrates exceptional interfacial compliance, thermal conductivity, and processing durability, presenting a disruptive solution for thermal management in electronics.
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Lin et al. (2025) studied this question.
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