Analysis reveals detailed XPS and Auger spectra of tantalum nitride films, indicating their electronic structure and properties.
Ta3N5 film is prepared by high-temperature nitridation of the Ta2O5 film deposited on the Nb substrate via electron beam evaporation, while the TaN film is prepared by high-temperature nitridation of Ta foil. Monochromatic Cr Kα radiation (5414.8 eV) is used to acquire XPS and Auger date on Ta3N5 and TaN samples. The reported spectra include a survey scan, high-resolution scans of Ta 4f7/2, 4f5/2, 5p3/2, 5p1/2, 5s, 4d5/2, 4d3/2, 4p3/2, 4p1/2, 4s, 3d5/2, 3d3/2, 3p3/2, 3p1/2, 3s, N 1s, and O 1s, and high-resolution scans of Auger lines.
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Cai et al. (2025) studied this question.
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