Review on Tribological and Corrosion Properties of Amorphous Silicon-Based Coatings Fabricated by Chemical Vapor Deposition

Chemical vapor deposition (CVD) is a crucial technique for fabricating high-performance amorphous silicon coatings, leveraging its process flexibility and microstructural controllability. Optimizing processes like hot-wire chemical vapor deposition, plasma-enhanced chemical vapor deposition, and catalytic chemical vapor deposition enable precise regulation of coating density, surface roughness, and chemical bonding. These amorphous silicon coatings exhibit outstanding tribological properties and exceptional corrosion resistance, primarily attributed to their unique amorphous structure eliminating grain boundary defects and forming dense passivation films. Future research should focus on intelligent process development, multi-field coupling failure analysis, environmental friendliness enhancement, and lifespan prediction models to advance this technology.