Study reveals that photostabilizers like aromatic Schiff bases reduce photodegradation in polystyrene films under ultraviolet exposure.
Objectives . Exposure to ultraviolet (UV) radiation initiates a photo-oxidative degradation process in plastics that causes broken chemical bonds, weight loss, and weakened crosslinking, as well as the formation of free radicals and release of volatile substances. The work aims to study the influence of UV radiation on polystyrene films containing low concentrations of highly aromatic Schiff bases. Methods . Utilizing the described casting technique, polystyrene films containing a small quantity of strong highly aromatic Schiff bases were produced. These films were then subjected to 300 h of UV irradiation. Following irradiation, analyses were conducted on the infrared spectra, weight loss, and surface morphology of the polystyrene. Results . The surface of the sheets was initially smooth and free of wrinkles. However, following irradiation, remarkable morphological changes were observed as the surface became more uneven. Intentional perforations and imperfections introduced into the examined surfaces were used to indicate the degradation of the polymer matrices. Conclusions . Highly aromatic Schiff bases act as photostabilizers to significantly reduce the extent of photodegradation in polystyrene films when compared to films with no additives.
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Hussain et al. (2025) studied this question.
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