This study reveals mechanisms of laser-induced doping, enhancing conductivity in diamond through defects and impurities by improving performance metrics.
As a wide-band gap semiconductor, the formation of conductive layers on diamond surfaces is crucial for overcoming its insulating properties. Laser-induced doping has been demonstrated to be effective in generating low-resistance conductive layers on diamond. However, the underlying mechanism remains poorly understood. This study employs a multiscale characterization approach, including TOF-SIMS, Raman spectroscopy, AFM, and variable-temperature Hall measurements, to propose a novel mechanism for diamond surface conductivity, highlighting the synergistic interaction between defects and impurities. At the microscopic level, vacancies and interstitial atoms form diffusion channels for phosphorus; at the macroscopic scale, defect-induced localized states reduce the carrier activation energy to 0.0192 eV, facilitating hole conduction. Experiments demonstrate that 248 nm laser irradiation, with its higher photon energy, induces a denser defect network, significantly increasing phosphorus doping depth and concentration, resulting in a resistivity as low as 1.1 × 10-3 Ω·cm. This study systematically investigates the influence of laser parameters on the performance of conductive layers on diamond surfaces and proposes a novel laser-induced conduction mechanism, providing a solid foundation for the doping and conduction theoretical framework of ultrawide band gap semiconductors.
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Guo et al. (2025) studied this question.
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