The technique improves angle measurement sensitivity in silicon crystals, indicating potential for advanced metrology.
We introduce an X-ray autocollimator using Laue diffraction in thick silicon crystals for ultra-precision angle measurement. The approach leverages angular amplification coupled with anomalous absorption effects in thick crystals on the basis of the dynamical theory of X-ray diffraction. An experiment with a thick silicon crystal of 5 mm shows a sensitivity of 142 μ m/ µ rad for the (220) reflecting atomic planes, outperforming the traditional autocollimator by two orders of magnitude with compactness. This development, in combination with traditional autocollimators, facilitates high-sensitivity, broad-angle measurements and opens up new opportunities for precision metrology in advanced fourth-generation synchrotron radiation facilities.
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Sun et al. (2025) studied this question.
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