This analysis conducts ReaxFF molecular dynamics to explore ultraviolet radiation effects on diamond PCMP, revealing its impact on atomistic interactions.
Photo-chemical mechanical polishing (PCMP) serves as a critical technique for enabling extremely precise fabrication processes in diamond material processing. This study employs ReaxFF Molecular Dynamics simulations to model the surface processing dynamics of single-crystal diamonds during PCMP. A microscopic-level investigation was conducted to analyze the detachment processes of surface carbon in diamond structures. A systematic investigation was conducted to elucidate ultraviolet radiation effects on nanoscale material removal dynamics in diamond PCMP, coupled with quantitative analysis of operational parameter impacts on surface finishing quality and associated atomistic interactions.
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Xu et al. (2025) studied this question.
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