Discharge Characteristics and Active Particle Distribution Mechanism of Ar/O₂/CF₄ Dielectric Barrier Discharge

The unclear links between macroscopic input parameters and microscopic active particle motions in DBD plasma impeded controllable plasma processing. This paper investigates effects of O₂/CF₄ content on Ar‐DBD characteristics and active particle distributions using a flat‐plate reactor and fluid model of 10–50 kHz. Results suggest adding CF 4 promotes filament discharge, while O 2 favors uniform glow discharge. Near‐equal O₂/CF 4 content yields mixed mode. Higher O₂/CF 4 content reduces most active particle densities (except O⁺) but increases all particle fluxes to material surface. Elevated frequency boosts total density and flux of O, O⁺, O⁻, F, F⁻ particles. Spatially, F/F⁻/O⁺ particles concentrate centrally, O/O⁻ distribute peripherally‐increased frequency shifts O enrichment area inward and expands F/F⁻ enrichment area outward.