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Assessment of changes in the texture of the silicon surface under the influence of a magnetic field and high-temperature plastic deformation using fractal analysis

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This assessment shows changes in silicon texture under magnetic field and deformation, indicating significant effects on dislocation movement.

Magnetic treatment increases fractality and alters silicon surface texture, enhancing structural properties.
The study determined fractal dimension and lacunarity to analyze changes in dislocation structures in silicon.
Applying high-temperature plastic deformation in a magnetic field resulted in defect-free silicon structures after treatments.
Utilizing the Czochralski method for silicon wafers enabled controlled damage and analysis of dislocation behavior.

Krit et al. (2025) studied this question.

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This assessment shows changes in silicon texture under magnetic field and deformation, indicating significant effects on dislocation movement.