Plasma Controlled Growth Dynamics and Electrical Properties of Ag Nanofilms via RF Magnetron Sputtering

Silver thin films are widely utilized in plasmonic, electronic, and catalytic devices due to their excellent conductivity, optical properties, and surface activity. However, the nanostructure and performance of Ag films are highly dependent on deposition parameters, particularly during radio-frequency magnetron sputtering (RF-MS). In this study, we systematically investigate the effects of RF power, sputtering time, and substrate type on the growth behavior, crystallinity, and electrical conductivity of Ag films. Optical emission spectroscopy (OES) and Langmuir probe diagnostics were employed to analyze the plasma environment, revealing the evolution of electron temperature and plasma density with varying RF powers. Structural characterizations using XRD, SEM, and AFM demonstrate that higher RF power results in reduced grain size, increased film density, and improved crystallinity, while deposition time influences film thickness and grain coalescence. Substrate material also plays a key role, with Cu substrates promoting better crystallinity due to improved lattice matching. Electrical measurements show that denser films with larger grains exhibit lower sheet resistance. These findings provide a comprehensive understanding of the plasma–film interplay and offer strategic insights for optimizing silver nanofilms in high-performance optoelectronic and catalytic systems.