Comprehensive study on epitaxial growth of GeSn(111) layers with high Sn content on Si(111) featuring Ge buffer layer

The study comprehensively discussed the crystalline properties of GeSn(111) epitaxial layers on Si(111) using Ge double buffer layers toward the formation of the direct transition GeSn(111) with a Sn content around 10%. We found that the introduction of Ge double buffer layers is rather effective to improve the crystallinity of GeSn(111) than the single buffer case. However, thicker Ge buffer layer degrades the crystallinity of GeSn(111) because the strain relaxation of GeSn layer is likely to occur. In this study, through optimizing the thicknesses of Ge buffer layers formed at low and high temperatures (LT-Ge and HT-Ge, respectively), it was clarified that 100 and 500 nm for LT- and HT-Ge thicknesses, respectively, are suited to realize a high quality GeSn(111). The grown GeSn(111) epitaxial layer includes a Sn content of ~8–11% with a compressive strain of ~1–2%, which is contained within the region of direct transition GeSn(111).