Conformal Growth of Nano‐Patterned Monolayer MoS₂ with Periodic Strain via Patterned Substrate Engineering for High‐performance Photodetectors

The extraordinary mechanical compliance of 2D molybdenum disulfide (MoS 2 ) makes it an ideal candidate for strain modulation of various electrical and optical properties. However, developing facile methods for accurate and stable engineering of strain still remains a major challenge. Here, a novel and effective method is demonstrated for introducing periodic strain into monolayer MoS 2 by direct growth on nano‐patterned sapphire substrates (NPSS). A mixed aqueous solution of Na 2 MoO 4 and NaOH is spin‐coated on the NPSS and sulfurated in one step by chemical vapor deposition (CVD). Highly oriented monolayer MoS 2 single‐crystal nanosheets with high quality and few sulfur vacancies are achieved conformally on the NPSS via a liquid‐mediated growth mode. Notably, the periodically distributed blue shift of the PL emission peak demonstrated periodic compressive strain is introduced into the nano‐patterned MoS 2 via the thermal expansion difference between MoS 2 and substrates. Furthermore, photodetectors fabricated using the nano‐patterned monolayer MoS 2 exhibit a high photo‐to‐dark current ratio (PDCR) over 10 6 , an excellent detectivity of 5.4 × 10 13 Jones, and a fast photoresponse of 7.7 ms, owing to the strain‐induced back‐to‐back built‐in electric field, enhanced light absorption by light‐scattering effect and fewer S vacancy defects. The scanning imaging demonstration based on the single‐pixel nano‐patterned MoS 2 photodetector further confirms its great potential in image sensors. This work hereby presents a pathway for direct conformal growth of nano‐patterned monolayer MoS 2 with precisely periodic strain, which should inspire the applications for high‐performance optoelectronic devices via the strategy of patterned substrate engineering by the periodic nanostructures.