Metal oxides such as titanium oxide (TiO₂) and zirconium oxide (ZrO₂) have attracted a great interest in recent years due to their many remarkable physical and chemical properties. The high performance of these materials allows their use in a wide range of applications such as photocatalysis, mechanics and chemistry. They are also used in optical applications; as sensors, anti-counterfeiting devices, or in medical applications for dental implants. In this paper, we present a process for structuring thin films of metal oxides using a sol-gel deposition method. Unlike more conventional methods such as reactive sputtering, chemical vapor deposition and atomic layer deposition, this technique facilitates the micro-nano structuring of films by optical lithography techniques, in particular colloidal lithography.
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Mandoukou et al. (2024) studied this question.
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