Micro-nanostructuring by optical-lithography and nitriding of photo-patternable ZrO2 sol-gel to obtain micro-nanostructured ZrN

Zirconium nitride (ZrN) combines plasmonic properties in the visible and near infrared spectral region with good mechanical properties, high thermal and chemical stability making it a very promising alternative to noble metals for optical applications at high temperature or in extreme environments. The authors present a new process for the elaboration of micro-nanostructured ZrN from a photo-patternable ZrO₂ sol-gel and a nitridation process, by rapid thermal annealing. This sol-gel is patternable by optical lithography, it allows to easily and quickly produce patterned ZrN layer.