Transparent conductive nanostructures with low refractive index

Transparent and conductive oxides offer metal-like conductivity and high transmission in the visible spectrum. However, they suffer from reflection losses at the film interface due to their high refractive index. A method for producing an ITO nanostructure through plasma etching in a conventional deposition plant equipped with an APS plasma source is presented, resulting in conductive nanostructures with an effective refractive index as low as 1.3. This nanostructure was combined with an AR coating achieving minimal reflectance while maintaining a conductive surface that enables the removal of surface charges as it is needed in AR coatings for quantum computing applications.