Unique needs of multi-beam mask writing as applied in merchant multi-node applications

We will review the evolving merchant motivations for multi-node MBMW deployment including usage landscape and market dynamics. Requirements are broadened to include flexibility, process of record matching, cost, yield, multi-node cycle time, process extension and multi-product R&D pathfinding. Specific attention is paid to model based methods and metrology techniques that assist in efficient adoption of the MBMW systems into already qualified single beam based flows while, at the same time, enable cost effective MBMW based new node development and initial production.