The multi-beam mask writer MBM-3000 designed to achieve N2 device technology node was released. The key concepts of the MBM-3000 are compatible with better resolution and faster throughput than our current multi-beam writer MBM- 2000PLUS. In order to reach these objective, the MBM-3000 is equipped with 12-nm beamlets, a single powerful electron source, a new optics design and enhanced data path systems. The smaller beamlets produce improved resolution and decreased productivity. However, the powerful cathode, which outputs a beam current density of 3.6A/cm², prevent declined throughput. The new optics systems and enhanced data path support both the better resolution and the throughput.
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Oshiro et al. (2024) studied this question.
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