Manufacturing and metrology of 3D holographic structure nanopatterns in roll-to-roll fabrication

Eliminating the need for multilayer alignment in nanoscale manufactured devices will streamline the lithography process and open up avenues for flexible substrate roll-to-roll (R2R) manufacturing. A system capable of single-exposure 3D holographic lithography with in-line metrology and real-time feedback will revolutionize micro and nano manufacturing. Work towards such developments are demonstrated to show promise in the field of nanopatterning.