Novel Multi-Beam Holography for Lithography

From smartphones to artificial intelligence chips, nearly all modern electronics depend on lithography to drive device miniaturization. Realizing nanoscale linewidths and fabricating intricate patterns remain central challenges for lithographic technologies. This work presents a novel multi-beam holography method capable of generating complex patterns for lithography. We demonstrate and systematically analyze the mechanism for the generation of sharp, complex bright fringes within an optical cavity equipped with phase-modulating elements. Through analysis of the types of split-amplitude interference and the position of the localized plane, two practical implementation schemes are established. For each scheme, we examine the key factors governing linewidth performance as well as its fundamental theoretical limits. Numerical simulations confirm the feasibility of our approach, yielding full width at half-maximum (FWHM) values below 1/10 of the wavelength. Theoretical projections further suggest that linewidths narrower than 1/20 of the wavelength are attainable. Requiring only a highly compact optical arrangement, the proposed technique delivers both narrow-linewidth features and sophisticated patterns, highlighting its promise as an alternative lithographic platform.