The Role of Potassium and Nano-Silicon in some Growth and Yield Indicators of Potato Under Water Stress Condition

A field experiment was conducted during the spring season of 2023 at the Agricultural Research Station (1) affiliated to the College of Agriculture, University of Anbar, in Ramadi city, on a sandy loam soil texture. The aim was to investigate the effect of different levels of potassium (K0 (0 kg K 2 O ha −1 ), Kt (300 kg K 2 O ha −1 ), Kn1 (15 kg K 2 O ha −1 ), Kn2 (30 kg K 2 O ha −1 )) along with spraying nano-silicon at two levels (Si1 (0 ppm), Si2 (80 ppm)) with irrigation at different water stress levels (35%) I1, (45%) I2, (55%) I3) of plant-available water on some potato growth and yield parameters. The experiment was designed as a nested design, with water stress levels representing the main plot, while potassium and silicon levels were considered subplots. The experiment was conducted in a randomized complete block design (RCBD) with three replicates. The results of the statistical analysis showed that the highest significant value in the plant height trait was for the I1Kt treatment with a value of (78.17 cm). In the leaf area trait, the (I1Kn2) treatment recorded the highest significant value of (131.83 dm 2 plant −1 ). The (I1Kt) treatment had the highest significant value of (4.9 stems plant −1 ) in the number of main aerial stems trait. As for the dry weight of the vegetative mass trait, the (I1Kt) treatment had the highest significant value with a value of (88 g plant −1 ). While the triple interaction achieved when (I1KtSi2) achieved a value of (56.818 Megagram ha −1 ), which was the highest significant value in the total yield trait The (I2KtSi2) treatment also gave the highest significant value of (39.68%) in the fertilization efficiency trait for production.