P‐7.25: The Application of Compound Inhibitors in Copper Etching Solutions

This paper focuses on the application of complex inhibitors in copper etching solutions. When 5‐methyltetrazolium (MTZ) and 5‐aminotriazole (ATZ) are used together, it has a very excellent synergistic effect on corrosion inhibition, mainly because the addition of MTZ can make the adsorption film formed by ATZ on the copper surface more dense, so as to effectively improve the corrosion inhibition efficiency. The synergistic effect of corrosion inhibition of these two substances can effectively reduce the amount of inhibitors in the etching solution, so that the etching taper angle will not become larger, which provides a new perspectives for the development of etching solution of the gate electrode in TFT LCD.