Study on the Dispersing Effect and Mechanism of Labsa on SiO₂ in an Alkaline Barrier Slurry

In chemical mechanical polishing (CMP) slurry, the introduction of oxidizers, corrosion inhibitors, and other components often leads to the aggregation of SiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> . In this paper, the dispersing effect and mechanism of anionic surfactants linear alkyl benzenesulfonic acid (LABSA) on colloidal silica in a weakly alkaline slurry for cobalt barrier layer were investigated by experimental and simulation methods. The results show that the doublelayer adsorption formed by a high concentration of deprotonated LABSA can effectively disperse SiO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> particles.