Efficient and highly accurate methods and tools for process window analysis are urgently needed in integrated circuit manufacturing. We have developed a convolutional neural network-based automated process window analysis tool, which can analyze process windows from raw data efficiently. Our tool utilizes convolutional neural network and well-trained models for classifying critical dimension scanning electron microscope images to enhance efficiency and reduce errors for process window analysis. Furthermore, we propose an image segmentation-based classification method to further improve accuracy. The proposed method is potential for expedited and highly accurate process window analysis.
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Chen et al. (2024) studied this question.
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