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We introduce the traceable calibration of a cryogenic localization microscope, enabling accurate localization of quantum dots to improve subsequent integration into photonic cavities. We combine the calibration results with an assessment of fabrication accuracy by electron-beam lithography to introduce a comprehensive model of the effects of registration errors in the integration process on Purcell factor. Our theory shows the possibility of significantly improving the magnitude and distribution of Purcell factor across a wide field, enabling dramatic increases of process yield.
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Copeland et al. (2024) studied this question.
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