Development and optimization of CMOS-compatible AlN-based photonic devices for 1.55 µm applications: fabrication, characterization, and potential for integrated optics

This study presents the development and optimization of AlN-based optical waveguides and photonic devices for 1.55 μm applications, utilizing a CMOS-compatible sputtered thin film technology. The fabrication employs a two-step photoresist technique to fabricate AlN core waveguides with low propagation losses and other optical devices, such as a 1×2 multimode interference (MMI) coupler, Mach-Zehnder interferometers and ring resonators. The results of this study highlight the potential for efficient and cost-effective fabrication of AlN-based integrated optical circuits and pave the way for further research and development in the field of integrated optics.