Improving line edge roughness using virtual fabrication

In this paper, we systematically explore potential Line edge roughness (LER) improvements that may be achieved on both line and via patterns by using the deposition/etch cycling process by virtual fabrication. The results show that deposition/etch cycling process is very effective in reducing high frequency noise and most of the LER and CD uniformity improvement occurs during the first deposition/etch cycle. These results can provide quantitative guidance on the optimal selection of deposition/etch amounts and the number of cycles needed to reduce LER.