Controlled Nanopore Fabrication on Silicon via Surface Plasmon Polariton-Induced Laser Irradiation of Metal–Insulator–Metal Structured Films

In this study, we present a cost-effective approach for fabricating nanopores on single-crystal silicon using a silver–alumina–silver (Ag/AAO/Ag) metal–insulator–metal (MIM) structured mask. Self-ordered porous anodic aluminum oxide (AAO) films were prepared via two-step anodization and coated with silver layers on both sides to form the MIM structure. When irradiated with a 532 nm nanosecond laser, the MIM mask excites surface plasmon polaritons (SPPs), resulting in a localized field enhancement that enables the etching of nanopores into the silicon substrate. This method successfully produced nanopores with diameters as small as 50 nm and depths up to 28 nm. The laser-induced SPP-assisted machining significantly enhances the specific surface area of the processed surface, making it promising for applications in catalysis, biosensing, and microcantilever-based devices. For instance, an increased surface area can improve catalytic efficiency by providing more active sites, and enhance sensor sensitivity by amplifying response signals. Compared to conventional lithographic or focused ion beam techniques, this method offers simplicity, low cost, and scalability. The proposed technique demonstrates a practical and efficient route for the large-area subwavelength nanostructuring of silicon surfaces.