High‐Fidelity Micro‐Pattern Printing Based on Non‐Uniform Sampling Holographic Femtosecond Laser

Holographic femtosecond laser printing has been widely used for the fabrication of micro‐patterned structures owing to its high efficiency and flexibility. However, conventional pixel‐based patterns rely on high‐density uniform sampling, which imposes limits on pattern fidelity and computational efficiency. In this work, a high‐fidelity micro‐pattern printing method is proposed based on a non‐uniform sampling holographic femtosecond laser. Precise control of pattern contours is achieved at a low global sampling number by performing local non‐uniform sampling, which is enabled by replacing the Fast Fourier Transform with a non‐uniform matrix triple product formulation for diffraction calculation. In addition, an adaptive holographic field modulation strategy is established, where amplitude‐weight compensation is introduced to address the diffraction imbalance arising from differences in sampling point area. Based on the method, vector‐defined patterns generated from functional expressions and engineering drawings are fabricated with high fidelity. For a representative “B” pattern, the computational efficiency improves by ≈9.4 times compared with the uniform‐sampling method, and the edge roughness is reduced from 330 to 120 nm. Finally, a millimeter‐scale Fresnel zone plate is fabricated by splicing multiple non‐uniform sampling holographic patterns, demonstrating the potential of the method for precision optical device manufacturing.