December 8, 2025New Journal of Chemistry

Effects of Hydroxyl and Trifluoromethyl Substituents on the Corrosion Inhibition of Benzotriazole Derivatives in Copper Surface Planarization

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Corrosion inhibition improved in copper surfaces with specific benzotriazole derivatives and substituents.
Key finding indicates substituents like trifluoromethyl enhance the effectiveness of inhibitors.
Chemical mechanical planarization was assessed for its efficacy in integrating circuits.
These findings may highlight the importance of substituent selection in material protection strategies.

Implication

Analysis demonstrates enhanced corrosion inhibition in copper using benzotriazole derivatives, indicating the role of substituents.

Abstract

Benzotriazole derivatives are the well-known corrosion inhibitors in chemical mechanical planarization (CMP) of integrated circuits, but the effect of their substituents on steric hindrance and hydrophilicity has been almost ignored....

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Cite This Study

Zhang et al. (2025) studied this question.

synapsesocial.com/papers/693624a44fa91c937236c406 https://doi.org/10.1039/d5nj04126k

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Implication

Analysis demonstrates enhanced corrosion inhibition in copper using benzotriazole derivatives, indicating the role of substituents.

Effects of Hydroxyl and Trifluoromethyl Substituents on the Corrosion Inhibition of Benzotriazole Derivatives in Copper Surface Planarization

Key Points

Implication

Abstract

Discussion

Cite This Study

Effects of Hydroxyl and Trifluoromethyl Substituents on the Corrosion Inhibition of Benzotriazole Derivatives in Copper Surface Planarization

Key Points

Implication

Abstract

Discussion

Cite This Study

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