Review demonstrates nanoparticle abrasive designs improve surface polishing performance, suggesting innovation in CMP techniques.
The Front Cover illustrates SiO 2 chemical–mechanical polishing, where a rotating pad and slurry deliver nanoparticle abrasives to the surface. The three ceramic nanoparticles in distinct morphologies in the foreground represent the diverse, rapidly evolving abrasive designs developed to improve polishing performance. More information can be found in the Review by D.-H. Ha and co-workers (DOI: 10.1002/chem.202502584 ).
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Lee et al. (2026) studied this question.
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