Research Article demonstrates improving nanostructure fabrication using thermal treatment of resist, suggesting advances for photonics and biomimetics.
Grayscale 3D-Nanostrucures In the Research Article (DOI: 10.1002/admi.202500632) Winnie Edith Svendsen and co-workers demonstrate the fabrication of high-resolution 3D nanostructures using grayscale electron beam lithography. By tuning exposure dose and post-exposure thermal treatment of novolak-based resist, they reveal dose and temperature dependent reflow and chemical evolution, enabling fabrication of complex topographies for applications in photonics, biomimetics, and surface engineering. Art by Rahul Singh.
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Singh et al. (2026) studied this question.
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